Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A"
Complete removal of particles larger than 1μm and resist residue attached to the mask all at once.
The TWC-200A has been specifically developed for the cleaning of masks used in the exposure process. The main feature of this device is its ability to simultaneously and fully automatically remove both resist and particles adhered to the mask. In particular, for resist removal, a dedicated cleaning agent was developed in collaboration with a major chemical manufacturer, significantly improving the removal effectiveness while also considering safety and the global environment. The operator simply needs to place a cassette loaded with the mask. This enhances safety by eliminating exposure to hazardous chemicals and greatly contributes to improving the quality of the exposure process and yield.
- Company：TECHNOVISION, INC. main office
- Price：Other
